衬底片
Single crystal silicon slice as target, Ar and O_2 respectively as sputtering and reacting gas, a silicon oxides ( SiO_x) film was deposited on Al substrate by reactive magnetron sputtering.
以单晶硅片为靶材,高纯Ar和O2分别为溅射气体和反应气体,采用反应磁控溅射法在铝基体上制备了硅氧化物薄膜。
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